Formation of stable neutral copper bis-dithiolene thin films by potentiostatic electrodeposition
نویسندگان
چکیده
منابع مشابه
Formation of stable neutral copper bis-dithiolene thin films by potentiostatic electrodeposition.
Thin films of neutral copper dithiolenes have been prepared by potentiostatic electrodeposition. This method allows the isolation of near infrared (NIR) active species, in a useable form, that are otherwise unobtainable by conventional chemical methods.
متن کاملAgInSe2 thin films prepared by electrodeposition process
In this work, the one step electrodeposition process was used to prepare Ag-In-Se thin films. The films were deposited at room temperature from a bath containing 1-3x10 M AgNO3, 6x10 -2 M InCl3 and 3x10 -2 M of H2SeO3. The KSCN at a concentration of 0.681 M was used as complexing agent. The pH value of the solution was 1.4. Applied potentials to SCE were chosen between -0.3 V and -1.1 V. Films ...
متن کاملElectrodeposition of Bi1ÀxSbx Thin Films
Bismuth and antimony are semimetals with a rhombohedral crystal structure and similar lattice parameters. Bi12xSbx alloys exhibit unusual electronic properties and are of interest for thermoelectric and magnetoelectronic devices. In this paper, we show that Bi12xSbx alloys can be electrodeposited from acidic chloride-based solutions and that a homogenous solid solution is obtained across the en...
متن کاملSurfactant-Assisted Electrodeposition of CoFe-Barium Hexaferrite Nanocomposite Thin Films
The influences of anionic sodium dodecylsulfate (SDS) and cationic Hexadecyltrimethylammonium bromide (HTAB) surfactants on the incorporation and distribution of barium hexaferrite nanoparticles in the electrodeposited CoFe-BaFe12O19 composite thin films were studied. Sulphate bathes with natural pH containing 0 to 2 g/L surfactants were used for electroplating at room temperature. Field emissi...
متن کاملFormation of Cupric Oxide Films on Quartz Substrates by Annealing the Copper Films
In the present work, cupric oxide (CuO) films were obtained through thermal annealing of the copper (Cu) films deposited on quartz substrates by DC magnetron sputtering method. The annealing was performed in air atmosphere for different times ranging from 60-240 min at temperature of 400 ºC. The influence of annealing times on structural and morphological properties of the films was investi...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Chemical Communications
سال: 2011
ISSN: 1359-7345,1364-548X
DOI: 10.1039/c1cc12344k